CN
苏州美芝恩电子科技有限公司
CN
苏州美芝恩电子科技有限公司
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Micro-nano Graphics
Manual Exposure Machine
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Use

Typical Applications

I-line light source has multiple exposure modes and adjustable exposure energy, which can adapt to different process requirements and meet the requirements of different chip manufacturing; advanced energy control technology ensures the consistency and reliability of each exposure, can achieve micron-level graphic exposure, and support back-side alignment lithography and bonding alignment processes.

Principle

The circuit and functional area patterns required for chip production are copied from the mask to the sample.

Technical Indicators

  • Overlay accuracy

    Front overlay accuracy: ≤1μm, back overlay accuracy: ≤2μm;

  • Minimum feature size

    1.2μm；

  • Sample size

    Maximum 6 inches, minimum 1cm*1cm;

  • Sample thickness

    ＜3mm；

  • Mask size

    Maximum 7 inches, minimum 5 inches;

  • Exposure mode

    Soft contact, hard contact, vacuum, proximity (pitch: 10-300μm)

  • Exposure intensity

    8.8-9.2 mW/cm2;

  • Illumination non-uniformity

    Within 3%.

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