Micro-nano Graphics
Fully automatic developing machine
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15050455470

Use

Typical Applications

Suitable for 4/6 inch wafer development.

Principle

Utilizing precise mechanical devices and microcomputer control systems, functions such as high-precision time control and speed monitoring are achieved.

Support

Incomplete samples cannot be processed.

Technical Indicators

  • Sample size

    4/6 inch wafer;

  • Speed ​​range

    0-6000 rpm;

  • Non-uniformity of coating

    ≤0.5%;

  • Minimum line width of development

    0.45μm。

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