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苏州美芝恩电子科技有限公司
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苏州美芝恩电子科技有限公司
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Wafer Cleaning
Ultrasonic Cleaning Machine
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15050455470

Use

Typical Applications

Wafer cleaning, stripping, etc.

Principle

The organic liquid can dissolve organic matter such as photoresist to achieve the purpose of cleaning wafers or stripping.

Support

4-inch and 6-inch silicon wafers, SiC wafers, sapphire wafers, and glass wafers.

Technical Indicators

  • Types of organic cleaning room processes

    Cleaning/stripping/desging process;

  • Organic chemical drugs

    Acetone, isopropyl alcohol, ethanol, 3038 developer, trichloroethylene, TMAH, NMP, etc.;

  • Provide equipment

    Constant temperature water bath heating equipment, hot plate heating equipment, ultrasonic cleaning equipment, spin drying equipment, etc.

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